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nanometrics 210.

the Nanometrics 210 Automatic Film Thickness measurement system

modular electronics

  • Nanometrics 210 Film Measurement System
  • Stage – dual 4″ wafers – larger stage can be supplied
  • Range of Thicknesses: 100 to 500,000 angstroms
  • Spot Size: 50 um with 5x objective, 25 um with 10x objective, 6.5 um with 40x objective
  • System includes an Olympus M10x and M40x objective
  • Optional Objectives are Olympus M5X and M100X

film types

  • Oxide on Silicon
  • Nitride on Silicon
  • Negative Resist on Silicon
  • Polysilicon on Oxide
  • Negative Resist on Oxide
  • Nitride on Oxide
  • Polyimide on Silicon
  • Positive Resist on Silicon
  • Positive Resist on Oxide
  • Reflectance Mode

additional notes

Our Nano 210 AFT systems are supplied with a calibration certificate which is traceable to NIST and are fully serviced by our factory trained engineer prior to shipping.

The Nanometrics 210 AFT system ships with a brand new photo multiplier tube which is pre-installed and tested prior to shipping plus, we provide full installation and training for all supplied systems.

we produce & supply spares for a range of products

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we produce & supply spares for a range of products

general aviation >

engineering spares >

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